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LNF:Technology: Difference between revisions
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→60 keV DANFYSIK ION IMPLANTER
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===60 keV DANFYSIK ION IMPLANTER=== | ===60 keV DANFYSIK ION IMPLANTER=== | ||
[[File:Foto0045.jpg|500px|thumb|right|60 keV ion implanter beam line at CIEMAT]] | [[File:Foto0045.jpg|500px|thumb|right|60 keV ion implanter beam line at CIEMAT]] | ||
This facility permits ion implantation at energies up to 60 keV. For instance, helium, hydrogen and duterium ions have been implanted for a range of studies related with fusion research. The implanter staff have designed and developed different irradiation chambers and experimental set-ups depending on the study requirements. The developed experimental systems permit in-situ optical, electrical and desorption measurements. For instance simultaneous ionoluminescence and surface electrical conductivity measurements can be made thus allowing correlation between macroscopic material degradation and defects produced by implantation. | This facility permits ion implantation at energies up to 60 keV. For instance, helium, hydrogen and duterium ions have been implanted for a range of studies related with fusion research. The implanter staff have designed and developed different irradiation chambers and experimental set-ups depending on the study requirements. The developed experimental systems permit in-situ optical, electrical and desorption measurements. For instance simultaneous ionoluminescence and surface electrical conductivity measurements can be made thus allowing correlation between macroscopic material degradation and defects produced by implantation. | ||