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LNF:Technology: Difference between revisions
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→60 keV DANFYSIK ION IMPLANTER
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This facility permits ion implantation | This facility permits ion implantation at energies up to 60 keV. For instance, helium, hydrogen and duterium ions have been implanted for a range of studies related with fusion research. The implanter staff have designed and developed different irradiation chambers and experimental set-ups depending on the study requirements. The developed experimental systems permit in-situ optical, electrical and desorption measurements. For instance simultaneous ionoluminescence and surface electrical conductivity measurements can be made thus allowing correlation between macroscopic material degradation and defects produced by implantation. | ||
Beam characteristics; | Beam characteristics; | ||
* | *Beam energy: up to 60 keV. | ||
* | *Beam current: up to 150 µA depending on ion. | ||
* | *Sample size: from ≈ 3 mm2 to about 4x2 cm2 | ||
*Unfocused beam diameter at target: ≈ 1 cm | |||
The facility has been used regularly to implant H, He, D ions in metals and insulators in order to evaluate microstructural surface degradation, ionoluminescence, surface electrical degradation and to implant He and H isotopes to perform diffusion and desorption experiments. | |||
These studies can be carried out at controlled temperatures, from liquid nitrogen up to 1000 C. Available special irradiation chambers and sample holders have been designed by the implanter staff and fabricated at the Ciemat workshops. | |||
===NAYADE Co-60 irradiation facility=== | ===NAYADE Co-60 irradiation facility=== | ||