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LNF:Technology: Difference between revisions
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The routine gamma dosimetry is performed using the commercially available Red Perspex™ 4034 Harwell dosimeters, they are polymethylmethacrylate (PMMA) dosimeters that have become widely used in routine high-dose rate dosimetry in the field of the industrial radiation processing. When exposed to ionising doses in excess of 1 kGy, the Red 4034 polymer starts to darken due to the formation of a new absorption band peaking at 615 nm and extending from 600 nm to beyond 700 nm. The absorbed dose is therefore determined by measuring its radiation-induced absorbance in the 630 | The routine gamma dosimetry is performed using the commercially available Red Perspex™ 4034 Harwell dosimeters, they are polymethylmethacrylate (PMMA) dosimeters that have become widely used in routine high-dose rate dosimetry in the field of the industrial radiation processing. When exposed to ionising doses in excess of 1 kGy, the Red 4034 polymer starts to darken due to the formation of a new absorption band peaking at 615 nm and extending from 600 nm to beyond 700 nm. The absorbed dose is therefore determined by measuring its radiation-induced absorbance in the 630 | ||
==Material Characterization Facilities== | |||
===Focused Ion Beam - Secondary Electron Microscope (FIB-SEM)=== | |||
[[File:Foto0049.jpg|300px|thumb|right|FIB-SEM]] | |||
FIB-SEM: Carl Zeiss Auriga Compact field effect SEM with an electron acceleration voltage in the range of 0.5 to 30 kV and three different detectors for secondary and backscattered electrons. The system includes an XFlash Bruker EDS detector for compositional studies and it is possible to perform local point, line scan and mapping analyses. An electron back-scattered diffraction detector (EBSD) has been recently installed for the determination of crystalline phases and orientation with a sample angle of 70º. The microscope is also equipped with an FIB gallium gun with an acceleration voltage of 1 to 30 keV for cross section inspection and TEM samples preparation on conductive and insulating materials. | |||
===Secondary Ion Mass Spectrometry (SIMS)=== | |||
[[File:Foto0288.jpg|300px|thumb|right|SIMS]] | |||
SIMS: Hiden Analytical secondary ion mass spectroscopy equipment using oxygen or argon ions as primary ions with an energy of 5 keV. Mass identification (1 to 550 amu), depth profiling and static SIMS capabilities. The system is also useful for compositional mapping and it incorporates an electron gun for SIMS experiments in insulating materials. The electronegative ions can be better detected using a Cs ion gun, with an energy up to 5 keV. | |||