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LNF:Technology: Difference between revisions
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→60 keV DANFYSIK ION IMPLANTER
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===60 keV DANFYSIK ION IMPLANTER=== | ===60 keV DANFYSIK ION IMPLANTER=== | ||
[[File:Foto0045.jpg|500px|thumb|right| | [[File:Foto0045.jpg|500px|thumb|right|60 keV ion implanter beam line at CIEMAT]] | ||
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*Beam energy: up to 60 keV. | *Beam energy: up to 60 keV. | ||
*Beam current: up to 150 µA depending on ion. | *Beam current: up to 150 µA depending on ion. | ||
*Sample size: from ≈ 3 | *Sample size: from ≈ 3 mm<sup>2</sup> to about 4x2 cm<sup>2</sup> | ||
*Unfocused beam diameter at target: ≈ 1 cm | *Unfocused beam diameter at target: ≈ 1 cm | ||