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electrodynamic evolution and is not caused by a different coupling of the beam power issued from variations in the thermal plasma parameters. Additional ECRH power can be used for | electrodynamic evolution and is not caused by a different coupling of the beam power issued from variations in the thermal plasma parameters. Additional ECRH power can be used for | ||
density control purposes. Plasmas with co-NBI (NBI1) and counter-NBI (NBI2), as well as plasmas with balanced injection (NBI1+NBI2), will be explored. The level of optimum ECRH power will be determined depending | density control purposes. Plasmas with co-NBI (NBI1) and counter-NBI (NBI2), as well as plasmas with balanced injection (NBI1+NBI2), will be explored. The level of optimum ECRH power will be determined depending | ||
on the operation conditions considering that moderate electron temperature (below 800 keV) are desirable to favour shorter stabilization times. | on the operation conditions considering that moderate electron temperature (below 800 keV) are desirable to favour shorter stabilization times. Using off-axis ECRH injection may also help to reduce L/R time. | ||
The measured toroidal current will be compared to the computational/numerical estimates of the toroidal current generated by both neutrals beams once the bootstrap current contribution is removed. | The measured toroidal current will be compared to the computational/numerical estimates of the toroidal current generated by both neutrals beams once the bootstrap current contribution is removed. |
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